Home研究論文

研究論文

2018

Thioxanthone-anthracene-9-carboxylic acid as radicalic photoinitiator in the presence air atmosphere, Saliha Mutlu, Kohei Watanabe, Shigeru Takahara, Nergis Arsu*, J. Polym. Sci. Part A, 56, 1878–1883 (2018).

Oxime Type Photoacid Generators Having Adamantyl and Superstrong Acid Precursor Group, Masumi Yamamoto and Shigeru Takahara*, J. Photopolym. Sci. Technol., 30(5), 643-646 (2018).

Formation behavior of polyiodine complex in photocrosslinked polyvinyl alcohol fiber spun by electrospinning method, Sho Fujisawa, Masumi Yamamoto, Daiki Kashiwai, Pedram Azari, Ying Ying Khaw, Seng Neon Gan, and Shigeru Takahara*, J. Photopolym. Sci. Technol., 30(4), 569-574 (2018).

2016

Water Soluble Onium Salt Type Photo Amphoteric Compound Generator, Daisuke Kashiwai, Yuichi Kaneko, Takuma Sawada, Yusuke Sato, Shigeru Takahara*, J. Photopolym. Sci. Technol., 29(4), 617-622 (2016).

2015

Oxime type photoacid generators generators having adamantyl group, Sanae Wada, Yoshitaka Yagi, Kasumi Hase, Kota Nakajima, Shigeru Takahara*, J. Photopolym. Sci. Technol., 28(1), 55-59 (2015).

Formation and Dichroism of Poly (vinyl alcohol)-Iodine Complex in Photocurable Film, Shigeru Takahara,* Naoki Iwamura, Yusuke Ema, Yusuke Sato, Masanori Mizukoshi, Tomoki Nagano, and Nobuyuki Ichikuni, Polym. Adv. Technol., 26(4), 338-344 (2015).

2012

Cross-linking Reaction of polymer by Atmospheric Pressure Plasma Jet, Masaki Okada, * Takanobu Nakayama, Takuya Nagakura, Kieko Harada, Shigeru Takahara, Kazuyuki Sugita, Toshiyuki Satou, Toshihiko Hiaki, J. Photopolym. Sci. Technol., 25(4), 433-438 (2012).

Application of Graphene to Photosensitive Diazo/PVA Resist, Kieko Harada,* Masaki Okada, Toshihiko Hiaki, Kiyomi Matsuda, Shigeru Takahara, Katsuyoshi Hoshino, Kazuyuki Sugita, J. Photopolym. Sci. Technol., 25(4), 439-444 (2012).

2011

Application of Carbon Nanotubes (CNT) to Photo-sensitive Diazo/PVA Resist (3) ? Effect of CNT Length, Yohko Hanzawa,* Masahiro Nakada, Keiko Harada, Masaki Okada, Toshihiko Hiaki, Kiyomi Matsuda, Hiroshi Hamada, Shigeru Takahara, Kazuyuki Sugita, J. Photopolym. Sci. Technol., 24(4), 379-382 (2011).

2010

Application to Cryptand to Diazo/PVA Resist, Masaki Okada, Keiko Harada, Naohide Takamura, Toshihiko Hiaki, Kiyomi Matsuda, Hiroshi Hamada, Shigeru. Takahara, Kazuyuki Sugita, J. Photopolym. Sci. Technol., 23, 413-416 (2010).

Application of Carbon Nanotube (CNT) to Photosensitive Diazo/PVA Resist (2) - Conductivity, Keiko Harada, Masahiro Nakada, Kiyomi Matsuda, Shigeru. Takahara, Katsuyoshi Hoshino, Kazuyuki Sugita, J. Photopolym. Sci. Technol., 23, 137-140 (2010).

Fluorescent Spherical Particle Formation from Solid Polysilanes by the Aid of Laser Ablation and Photochemical Reaction, Hroshi Morita, Yu Aoki, Shigeru. Takahara, Masanobu Wakasa, J. Photopolym. Sci. Technol., 23, 371-378 (2010).

2009

Application of Carbon Nanotube (CNT) to Photosensitive Diazo/PVA Resist
Keiko Harada, Tetsuyuki Taniai, Masahiro Nakada, Hiroshi Hamana, Kiyomi Matsuda, Shigeru. Takahara, Kazuyuki Sugita
J. Photopolym. Sci. Technol., 22, 347-350 (2009).

Direct Observation of Intermediates in Sensitization Reaction of Anthracenes and Oxime Type Photoacid Generator in Polymer Matrix
Shigeru Takahara, Naoto Nishizawa, Tomoaki Tsumita
J. Photopolym. Sci. Technol., 22, 289-294 (2009).

2008

Mutifunctional photo acid generator for fluorescence imaging based on self-contained photoreaction
Takatsugu Endo, Shota Suzuki, Nobukazu Miyagawa, Shigeru Takahara
J. Photochem. Photobio. A:Chem., 200, 181-186 (2008).

Photochemistry of Naphthalimide Photoacid Generators
Jean-Pierre Malval, Shota Suzuki, Fabrice Morlet-Savary, Xavier Allonas, Jean-Pierre Fouassier, Shigeru Takahara, and Tsuguo Yamaoka
J. Phys. Chem., 112(17), 3879 - 3885 (2008).

Sensitization Reaction of Oxime Type Photoacid Generator
Shigeru. Takahara, Shota Suzuki, Tomoaki Tsumita, Xavier Allonas, Jean-Pierre Fouassier, Tsuguo Yamaoka
J. Photopolym. Sci. Technol., 21(4), 499-504 (2008).

Application of C60 to Photosensitive Diazo/PVA Resist
Keiko Harada, Tetsuyuki Taniai, Masahiro Nakada, Hiroshi Hamana, Kiyomi Matsuda, Shigeru. Takahara, Kazuyuki Sugita
J. Photopolym. Sci. Technol., 21(1), 59-62 (2008).

2007

On the cleavage process of the N-trifluoromethylsulfonyloxy-1,8-naphthalimide photoacid generator
J.P. Malval, F. Morlet-Savary, X. Allonas, J.-P. Fouassier, S. Suzuki, S. Takahara, T. Yamaoka
Chem. Phys. Lett., 443(4-6), 323-327 (2007).

2006

ビスイミダゾールを用いた光ラジカル重合系における高機能連鎖移動剤の分子設計
樽本直浩,髙原 茂
日本印刷学会誌,43(3), 34-40 (2006).

365nm用光ラジカル発生剤の開発
樽本直浩,髙原 茂
日本印刷学会誌,43(2), 26-32 (2006).

The Participation of the Anion and Alkyl Substituent of Diaryliodonium salts in the Photo-Initiated Cationic Polymerization Reaction
C-H. Park, S. Takahara, T. Yamaoka
Polym. Adv. Technol., 17(3), 156-162 (2006).

Pyrromethene dye sensitized photopolymer - photochemical behavior in polymer matrix and application to photoresist for printed circuit board
S. Suzuki, J. Iwaki, T. Urano, S. Takahara, T. Yamaoka
Polym. Adv. Technol., 17(5), 348-353 (2006).

Interaction mechanism in pyrromethene dye/photoacid generator photosensitive system for high-speed photopolymer
S. Suzuki, X. Allonas, J. P. Fouassier, T. Urano, S. Takahara, T. Yamaoka
J. Photochem. Photobio. A., 181(1) 60-66 (2006).

2005

A Novel Negative-tone Photopolymer Based on Photo-Initiated Cationic Polymerization of Epoxides in Polymer Film
C-H. Park, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 18(6), 719-727(2005).

Visible-Light-Sensitive Photo-Acid Generator Incorporating Food Dye for Use in Chemically Amplified Resists
N. Tarumoto, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 18(6), 673-677(2005).

Three-Component Photo Radical initiating System -The effect of 2-Mercaptobenzothiazole as a Co-initiator in Polymer Matrix-
S. Suzuki, P. Emilie, T. Urano, S. Takahara, T. Yamaoka
Polymer, 2238-2243 (2005).

Diphenyliodonium Salts with Pyranine Conk as an Environment-friendly Photo-acid Generator and Their Applications to Chemically Amplified Resists
N. Tarumoto, N. Miyagawa, S. Takahara, T. Yamaoka
Polymer J., 37(8), 545-549 (2005).

2004

Diphenyliodonium Salts with Diazoxide Group for a Photo-acid Generator
N. Tarumoto, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 17(5), 719-725 (2004).

Diphenyliodonium Salts with Environment-friendly Dye for a Photo-acid Generator in Chemically Amplified Resist
N. Tarumoto, N. Miyagawa, S. Takahara, T. Yamaoka
Polymer J., 36(10), 866-869 (2004).

Pyrromethene Dye Sensitized Photopolymer and the Application to Visible Laser Direct Imaging
S. Suzuki, T. Urano, K. Ito, T. Murayama, I. Hotta, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 17(1), 125-130 (2004).

Sensitization Mechanism of the Anthracene Derivatives/Photoacid Generator Photoinitiating System
J. Iwaki, S. Suzuki, C. Park, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 17(1), 123-124 (2004).

2003

Diphenyliodonium Salts with Diazixide Group for a Photo-acid Generator in Chemically Amplified Resist
N. Tarumoto, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 16(5), 697-700 (2003).

2002

Trivalent Iodine Compounds and Periodonium Salt as PAG
N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 15(3), 379-380 (2002).

Positive-Working DUV Resist Based on Terpene Derivatives as Cross-linker
C-H. Park, J. Lee, N. Miyagawa, S. Takahara, T. Yamaoka, K. Kaneshige, K. Saeki, T. Morikawa
J. Photopolym. Sci. Technol., 15(1), 141-144 (2002).

VIS-Sensitive Photopolymer Containing Vinyl Ether Compound and Pyrromethene Dye
S. Noppakundilograt, N. Miyagawa, S. Takahara, T. Yamaoka
Polym. Adv. Technol., 13, 527-533 (2002).

Negative-Working Photoresist of Methacrylate Polymers Based on the Transesterification of the 2-Hydroxyethyl Group in the Presence of an Acid
J. Lee, T. Aoai, S. Kondo, N. Miyagawa, S. Takahara, T. Yamaoka
J. Polym. Sci.: Chem., 40, 1858-1867 (2002).

Application of Photopolymer to Core-hair Type Microgels with Various Hair Length
T. Takahashi, H. Watanabe, N. Miyagawa, S. Takahara, T. Yamaoka
Polym. Adv. Technol., 13, 33-39 (2002) .

Photo-alignment Material with Azobenzene-functionalized Polymer Linked in Film
H. Watanabe, N. Miyagawa, S. Takahara, T. Yamaoka
Polym. Adv. Technol., 13, 1-9 (2002) .

2001

Dye Sensitized Photo-Acid Generation for 633 nm-Sensitive Positive-Working Photopolymer
S. Noppakundilograt, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 14(2), 273-274 (2001).

Carbazole as Photo-Sensitizer in Photoresist
H. Watanabe, K. Toda, M. Murata, Y. Kamoshida, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 14(2), 263-264 (2001).

Three-Component Photo Radical Initiating Systems -The effect of Accelerator-
S. Suzuki, T. Urano, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 14(2), 259-262 (2001).

2000

Visible Light-Sensitive Positive-Working Photopolymer Based on Poly(p-hydroxystyrene) and Viny Ether Crosslinker
S. Noppakundilograt, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 13(5), 719-722 (2000).

Positive-Type Photopolyimide Based on Vinyl Ether Crosslinking and De-Crosslinking
T. Nakano, H. Iwasa, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 13(5), 715-718 (2000).

Onium Salt Type Photoacid Generator Containing Tetrakis(pentafluorophenyl)borate
J-S. Lee, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 13(5), 711-714 (2000).

Cyclocopolymer from N-cyclohexyldimethacrylamide and Application to a Photoresist with Photo-Acid Generator
Y. Takao, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 13(5), 703-710 (2000).

Synthesis of Cyclized Copolymer from N-Substituted Dimethasrylamide and Application to a Photoresist with a Photo-Acid Generator
Y. Takao, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 13(2), 207-210 (2000).

Holographic Recording of Polysilane Photopolymer
M. Okada, H. Tsushima, M. Kawabata, I. Sumiyoshi, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 13(2), 205-206 (2000).

The Measurement of The Acid Diffusion in Vinyl Ether Crosslinked Photoresist by Impedance Method
Y. Araki, N. Miyagawa, S. Takahara, T. Yamaoka
J. Photopolym. Sci. Technol., 13(2), 243-246 (2000).

Water-dispersible Microgel Modified With Methacryloyl Groups by Ionic Bonding on the Surface and the Photopolymer Microgel
T. Takahashi, K. Ikegaya, H. Watanabe, N. Miyagawa, S. Takahara, T. Yamaoka
Polym. Adv. Technol., 11, 307-315 (2000) .


ページトップへ
Copyright (C) 無料テンプレート005 All Rights Reserved.